Applied Materials has found a new way to scale interconnects to smaller process geometries without compromising their effectiveness. It turns out a cobalt sheath can dramatically improve reliability at smaller process geometries. How combining cobalt and copper could improve chip yields, boost performance
Applied Materials has found a new way to scale interconnects to smaller process geometries without compromising their effectiveness. It turns out a cobalt sheath can dramatically improve reliability at smaller process geometries. Subscribe to iCameroon.Com Newsletter
